Granted Patent
Utility
US 6,007,406 · App. 08/984,730
Polishing systems, methods of polishing substrates, and method of preparing liquids for semiconductor fabrication process
Inventors:
Dan Custer, Aaron Trent Ward, Shawn M. Lewis
Patented Case
View Patent ↗
Granted: Dec 28, 1999
Filed: Dec 4, 1997
Inventors
Dan Custer
Aaron Trent Ward
Shawn M. Lewis
Assignee (at issue)
Micron Technology, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.