Granted Patent
Utility
US 6,007,949 · App. 08/924,535
Method of extracting a mask pattern for an electron beam exposure
Inventor:
Ken Nakajima
Patented Case
View Patent ↗
Granted: Dec 28, 1999
Filed: Sep 5, 1997
Inventor
Ken Nakajima
Assignee (at issue)
NEC CORPORATION
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.