Granted Patent
Utility
US 6,010,827 · App. 09/291,979
Electron beam exposure utilizing pre-processed mask pattern
Inventor:
Ken Nakajima
Patented Case
View Patent ↗
Granted: Jan 4, 2000
Filed: Apr 15, 1999
Inventor
Ken Nakajima
Assignee (at issue)
NEC CORPORATION
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.