Granted Patent
Utility
US 6,019,816 · App. 09/086,016
Systems and methods for removing residue from process gases exhausted from microelectronic device fabrication processes
Inventor:
Yu-il Lim
Patented Case
View Patent ↗
Granted: Feb 1, 2000
Filed: May 28, 1998
Inventor
Yu-il Lim
Assignee (at issue)
SAMSUNG DISPLAY CO., LTD.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.