Granted Patent
Utility
US 6,024,852 · App. 08/984,132
Sputtering target and production method thereof
Inventors:
Hidemasa Tamura, Norio Yokoyama, Eiichi Shimizu, Fumio Sasaki
Patented Case
View Patent ↗
Granted: Feb 15, 2000
Filed: Dec 3, 1997
Inventors
Hidemasa Tamura
Norio Yokoyama
Eiichi Shimizu
Fumio Sasaki
Assignee (at issue)
SONY GROUP CORPORATION
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.