Granted Patent
Utility
US 6,030,868 · App. 09/033,916
Elimination of oxynitride (ONO) etch residue and polysilicon stringers through isolation of floating gates on adjacent bitlines by polysilicon oxidation
Inventors:
Kathleen R. Early, Michael K. Templeton, Nicholas H. Tripsas, Maria C. Chan, Mark T. Ramsbey
Patented Case
View Patent ↗
Granted: Feb 29, 2000
Filed: Mar 3, 1998
Inventors
Kathleen R. Early
Michael K. Templeton
Nicholas H. Tripsas
Maria C. Chan
Mark T. Ramsbey
Assignee (at issue)
Advanced Micro Devices, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.