Granted Patent
Utility
US 6,040,236 · App. 08/923,746
Method for manufacturing silicon thin film conductive element
Inventor:
Fumiki Aiso
Patented Case
View Patent ↗
Granted: Mar 21, 2000
Filed: Sep 2, 1997
Inventor
Fumiki Aiso
Assignee (at issue)
NEC CORPORATION
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.