Granted Patent
Utility
US 6,042,652 · App. 09/390,710
Atomic layer deposition apparatus for depositing atomic layer on multiple substrates
Inventors:
Kwang-Soo Hyun, Kyung-Ho Park, Neung-goo Yoon, Kang-jun Choi, Soo-hong Jeong
Patented Case
View Patent ↗
Granted: Mar 28, 2000
Filed: Sep 7, 1999
Inventors
Kwang-Soo Hyun
Kyung-Ho Park
Neung-goo Yoon
Kang-jun Choi
Soo-hong Jeong
Assignee (at issue)
PK Companies Group, LLC
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.