Granted Patent
Utility
US 6,042,971 · App. 09/006,503
Method of manufacturing an EB mask for electron beam image drawing and device for manufacturing an EB mask
Inventors:
Takao Tamura, Hiroshi Yamashita, Ken Nakajima, Hiroshi Nozue
Patented Case
View Patent ↗
Granted: Mar 28, 2000
Filed: Jan 14, 1998
Inventors
Takao Tamura
Hiroshi Yamashita
Ken Nakajima
Hiroshi Nozue
Assignee (at issue)
NEC CORPORATION
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.