Granted Patent
Utility
US 6,048,435 · App. 08/675,093
Plasma etch reactor and method for emerging films
Inventors:
Stephen P. DeOrnellas, Alferd Cofer, Robert C. Vail
Patented Case
View Patent ↗
Granted: Apr 11, 2000
Filed: Jul 3, 1996
Inventors
Stephen P. DeOrnellas
Alferd Cofer
Robert C. Vail
Assignee (at issue)
TEGAL CORPORATION
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.