Granted Patent
Utility
US 6,060,132 · App. 09/097,872
High density plasma CVD process for making dielectric anti-reflective coatings
Inventor:
Gill Yong Lee
Patented Case
View Patent ↗
Granted: May 9, 2000
Filed: Jun 15, 1998
Inventor
Gill Yong Lee
Assignee (at issue)
Siemens Aktiengesellschaft
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.