Granted Patent
Utility
US 6,066,508 · App. 09/089,398
Process for manufacturing semiconductor integrated circuit device including treatment of gas used in the process
Inventors:
Yoshikazu Tanabe, Toshiaki Nagahama, Nobuyoshi Natsuaki, Yasuhiko Nakatsuka
Patented Case
View Patent ↗
Granted: May 23, 2000
Filed: Jun 3, 1998
Inventors
Yoshikazu Tanabe
Toshiaki Nagahama
Nobuyoshi Natsuaki
Yasuhiko Nakatsuka
Assignee (at issue)
HITACHI, LTD.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.