Granted Patent
Utility
US 6,068,540 · App. 09/080,912
Polishing device and polishing cloth for semiconductor substrates
Inventors:
Wolfgang Dickenscheid, Goetz Springer
Patented Case
View Patent ↗
Granted: May 30, 2000
Filed: May 18, 1998
Inventors
Wolfgang Dickenscheid
Goetz Springer
Assignee (at issue)
Siemens Aktiengesellschaft
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.