Granted Patent
Utility
US 6,069,054 · App. 08/997,604
Method for forming isolation regions subsequent to gate formation and structure thereof
Inventor:
Jeong Yeol Choi
Patented Case
View Patent ↗
Granted: May 30, 2000
Filed: Dec 23, 1997
Inventor
Jeong Yeol Choi
Assignee (at issue)
Integrated Device Technology, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.