Granted Patent
Utility
US 6,069,087 · App. 09/139,764
Highly selective dry etching process
Inventors:
David J. Keller, Barbara L. Casey
Patented Case
View Patent ↗
Granted: May 30, 2000
Filed: Aug 25, 1998
Inventors
David J. Keller
Barbara L. Casey
Assignees (at issue)
Micron Technology, Inc.
Applied Materials, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.