Granted Patent
Utility
US 6,069,092 · App. 09/178,431
Dry etching method and semiconductor device fabrication method
Inventors:
Shinichi Imai, Nobuhiro Jiwari
Patented Case
View Patent ↗
Granted: May 30, 2000
Filed: Oct 26, 1998
Inventors
Shinichi Imai
Nobuhiro Jiwari
Assignee (at issue)
Matsushita Electronics Corporation
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.