Granted Patent
Utility
US 6,071,797 · App. 08/719,958
Method for forming amorphous carbon thin film by plasma chemical vapor deposition
Inventors:
Kazuhiko Endo, Toru Tatsumi
Patented Case
View Patent ↗
Granted: Jun 6, 2000
Filed: Sep 24, 1996
Inventors
Kazuhiko Endo
Toru Tatsumi
Assignee (at issue)
NEC CORPORATION
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.