Granted Patent
Utility
US 6,071,822 · App. 09/127,762
Etching process for producing substantially undercut free silicon on insulator structures
Inventors:
John F. Donohue, David Johnson, Michael W. DeVre
Patented Case
View Patent ↗
Granted: Jun 6, 2000
Filed: Jul 31, 1998
Inventors
John F. Donohue
David Johnson
Michael W. DeVre
Assignee (at issue)
PLASMA-THERM LLC
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.