Granted Patent
Utility
US 6,074,478 · App. 09/006,880
Method of facet free selective silicon epitaxy
Inventor:
Shizuo Oguro
Patented Case
View Patent ↗
Granted: Jun 13, 2000
Filed: Jan 14, 1998
Inventor
Shizuo Oguro
Assignee (at issue)
NEC CORPORATION
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.