Granted Patent
Utility
US 6,074,953 · App. 09/141,810
Dual-source plasma etchers, dual-source plasma etching methods, and methods of forming planar coil dual-source plasma etchers
Inventors:
Kevin G. Donohoe, Guy T. Blalock
Patented Case
View Patent ↗
Granted: Jun 13, 2000
Filed: Aug 28, 1998
Inventors
Kevin G. Donohoe
Guy T. Blalock
Assignee (at issue)
Micron Technology, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.