Granted Patent
Utility
US 6,080,241 · App. 09/146,224
Chemical vapor deposition chamber having an adjustable flow flange
Inventors:
Tingkai Li, Dane C. Scott, Brian Wyckoff
Patented Case
View Patent ↗
Granted: Jun 27, 2000
Filed: Sep 2, 1998
Inventors
Tingkai Li
Dane C. Scott
Brian Wyckoff
Assignee (at issue)
EMCORE CORPORATION
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.