IP Library › Granted Patent US 6,087,074
Granted Patent Utility
US 6,087,074 · App. 09/359,732

Photomask and pattern forming method employing the same

Inventors: Norio Hasegawa, Fumio Murai, Katsuya Hayano
Patented Case View Patent ↗
Granted: Jul 11, 2000 Filed: Jul 23, 1999
Inventors
Norio Hasegawa
Fumio Murai
Katsuya Hayano
Assignee (at issue)
HITACHI, LTD.

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Quick Facts
Patent No.
US 6,087,074
App. No.
09/359,732
Filed
1999-07-23
Granted
2000-07-11
Kind
A