Granted Patent
Utility
US 6,090,523 · App. 09/054,885
Multi-resin material for an antireflection film to be formed on a workpiece disposed on a semiconductor substrate
Inventors:
Norihiko Samoto, Haruo Iwasaki, Atsushi Nishizawa, Tsuyoshi Yoshii, Hiroshi Yoshino
Patented Case
View Patent ↗
Granted: Jul 18, 2000
Filed: Apr 3, 1998
Inventors
Norihiko Samoto
Haruo Iwasaki
Atsushi Nishizawa
Tsuyoshi Yoshii
Hiroshi Yoshino
Assignee (at issue)
NEC CORPORATION
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.