Granted Patent
Utility
US 6,090,715 · App. 09/223,458
Masking process for forming self-aligned dual wells or self-aligned field-doping regions
Inventor:
Sang-Yong Kim
Patented Case
View Patent ↗
Granted: Jul 18, 2000
Filed: Dec 30, 1998
Inventor
Sang-Yong Kim
Assignees (at issue)
ASemiconductor, Inc.
Amkor Technology, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.