Granted Patent
Utility
US 6,093,293 · App. 09/026,446
Magnetron sputtering source
Inventors:
Walter Haag, Pius Grunenfelder, Urs Schwendener, Markus Schlegel, Siegfried Krassnitzer
Patented Case
View Patent ↗
Granted: Jul 25, 2000
Filed: Feb 19, 1998
Inventors
Walter Haag
Pius Grunenfelder
Urs Schwendener
Markus Schlegel
Siegfried Krassnitzer
Assignee (at issue)
Balzers Hochvakuum AG
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.