Granted Patent
Utility
US 6,093,932 · App. 09/114,912
Method of writing any patterns on a resist by an electron beam exposure and electron beam exposure system
Inventor:
Ken Nakajima
Patented Case
View Patent ↗
Granted: Jul 25, 2000
Filed: Jul 14, 1998
Inventor
Ken Nakajima
Assignee (at issue)
NEC CORPORATION
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.