Granted Patent
Utility
US 6,095,159 · App. 09/012,155
Method of modifying an RF circuit of a plasma chamber to increase chamber life and process capabilities
Inventors:
Guy T. Blalock, Kevin G. Donohoe
Patented Case
View Patent ↗
Granted: Aug 1, 2000
Filed: Jan 22, 1998
Inventors
Guy T. Blalock
Kevin G. Donohoe
Assignee (at issue)
Micron Technology, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.