Granted Patent
Utility
US 6,099,747 · App. 09/166,424
Chamber etching of plasma processing apparatus
Inventor:
Tatsuya Usami
Patented Case
View Patent ↗
Granted: Aug 8, 2000
Filed: Oct 5, 1998
Inventor
Tatsuya Usami
Assignee (at issue)
NEC CORPORATION
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.