Granted Patent
Utility
US 6,100,012 · App. 09/110,642
Infra-red radiation post-exposure bake process for chemically amplified resist lithography
Inventor:
Xuelong Shi
Patented Case
View Patent ↗
Granted: Aug 8, 2000
Filed: Jul 6, 1998
Inventor
Xuelong Shi
Assignee (at issue)
NATIONAL SEMICONDUCTOR CORPORATION
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.