Granted Patent
Utility
US 6,100,200 · App. 09/218,563
Sputtering process for the conformal deposition of a metallization or insulating layer
Inventors:
Peter C. Van Buskirk, Michael W. Russell, Daniel J. Vestyck, Scott R. Summerfelt, Theodore S. Moise
Patented Case
View Patent ↗
Granted: Aug 8, 2000
Filed: Dec 21, 1998
Inventors
Peter C. Van Buskirk
Michael W. Russell
Daniel J. Vestyck
Scott R. Summerfelt
Theodore S. Moise
Assignee (at issue)
ADVANCED TECHNOLOGY & MATERIALS CO., LTD.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.