Granted Patent
Utility
US 6,103,456 · App. 09/120,629
Prevention of photoresist poisoning from dielectric antireflective coating in semiconductor fabrication
Inventors:
Dirk Tobben, Gill Yong Lee
Patented Case
View Patent ↗
Granted: Aug 15, 2000
Filed: Jul 22, 1998
Inventors
Dirk Tobben
Gill Yong Lee
Assignee (at issue)
Siemens Aktiengesellschaft
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.