Granted Patent
Utility
US 6,110,328 · App. 08/759,431
Method of an apparatus for sputtering
Inventors:
Junichi Shimizu, Shujiro Watanabe, Satoru Takaki, Hisashi Osaki, Takuji Oyama, Eiichi Ando
Patented Case
View Patent ↗
Granted: Aug 29, 2000
Filed: Dec 5, 1996
Inventors
Junichi Shimizu
Shujiro Watanabe
Satoru Takaki
Hisashi Osaki
Takuji Oyama
Eiichi Ando
Assignee (at issue)
ASAHI GLASS CO., LTD.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.