Granted Patent
Utility
US 6,110,752 · App. 08/918,907
Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment
Inventor:
Herbert E. Litvak
Patented Case
View Patent ↗
Granted: Aug 29, 2000
Filed: Aug 27, 1997
Inventor
Herbert E. Litvak
Assignee (at issue)
Luxtron Corporation
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.