Granted Patent
Utility
US 6,113,705 · App. 09/137,298
High-speed rotational vapor deposition apparatus and high-speed rotational vapor deposition thin film method
Inventors:
Tadashi Ohashi, Katuhiro Chaki, Ping Xin, Tatsuo Fujii, Katsuyuki Iwata, Shinichi Mitani, Takaaki Honda, Yuusuke Sato
Patented Case
View Patent ↗
Granted: Sep 5, 2000
Filed: Aug 20, 1998
Inventors
Tadashi Ohashi
Katuhiro Chaki
Ping Xin
Tatsuo Fujii
Katsuyuki Iwata
Shinichi Mitani
Takaaki Honda
Yuusuke Sato
Assignees (at issue)
Toshiba Ceramics Co., Ltd.
Toshiba Kikai Kabushiki Kaisha
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.