Granted Patent
Utility
US 6,130,159 · App. 09/365,988
Apparatus and methods for minimizing as-deposited stress in tungsten silicide films
Inventors:
Sien G. Kang, John Y. Adachi, David Badt, Edward L. Sill, Hector Velasco
Patented Case
View Patent ↗
Granted: Oct 10, 2000
Filed: Aug 3, 1999
Inventors
Sien G. Kang
John Y. Adachi
David Badt
Edward L. Sill
Hector Velasco
Assignee (at issue)
Genus, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.