Granted Patent
Utility
US 6,130,166 · App. 09/241,270
Alternative plasma chemistry for enhanced photoresist removal
Inventor:
Edward Yeh
Patented Case
View Patent ↗
Granted: Oct 10, 2000
Filed: Feb 1, 1999
Inventor
Edward Yeh
Assignee (at issue)
VLSI Technology, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.