Granted Patent
Utility
US 6,130,729 · App. 09/311,597
Method of making an AMLCD where the etch stopper is formed without first preparing a pattern mask
Inventors:
Young Jin Oh, Kyoung-Nam Lim
Patented Case
View Patent ↗
Granted: Oct 10, 2000
Filed: May 14, 1999
Inventors
Young Jin Oh
Kyoung-Nam Lim
Assignee (at issue)
LG ELECTRONICS INC.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.