Granted Patent
Utility
US 6,132,292 · App. 09/161,218
Chemical mechanical polishing method suitable for highly accurate planarization
Inventor:
Akira Kubo
Patented Case
View Patent ↗
Granted: Oct 17, 2000
Filed: Sep 28, 1998
Inventor
Akira Kubo
Assignee (at issue)
NEC CORPORATION
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.