IP Library Granted Patent US 6,132,519
Granted Patent Utility
US 6,132,519 · App. 08/991,409

Vapor deposition apparatus and vapor deposition method

Inventors: Tadashi Ohashi, Katuhiro Chaki, Ping Xin, Tatsuo Fujii, Katsuyuki Iwata, Shinichi Mitani, Takaaki Honda
Patented Case View Patent ↗
Granted: Oct 17, 2000 Filed: Dec 16, 1997
Inventors
Tadashi Ohashi
Katuhiro Chaki
Ping Xin
Tatsuo Fujii
Katsuyuki Iwata
Shinichi Mitani
Takaaki Honda
Assignees (at issue)
Toshiba Ceramics Co., Ltd.
Toshiba Kikai Kabushiki Kaisha

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Quick Facts
Patent No.
US 6,132,519
App. No.
08/991,409
Filed
1997-12-16
Granted
2000-10-17
Kind
A