Granted Patent
Utility
US 6,132,910 · App. 09/204,940
Method of implementing electron beam lithography using uniquely positioned alignment marks and a wafer with such alignment marks
Inventor:
Yoshikatsu Kojima
Patented Case
View Patent ↗
Granted: Oct 17, 2000
Filed: Dec 3, 1998
Inventor
Yoshikatsu Kojima
Assignee (at issue)
NEC CORPORATION
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.