Granted Patent
Utility
US 6,136,499 · App. 08/812,418
Photoresist compositions comprising polycyclic polymers with acid labile pendant groups
Inventors:
Brian L. Goodall, Saikumar Jayaraman, Robert A. Shick, Larry F. Rhodes
Patented Case
View Patent ↗
Granted: Oct 24, 2000
Filed: Mar 6, 1997
Inventors
Brian L. Goodall
Saikumar Jayaraman
Robert A. Shick
Larry F. Rhodes
Assignee (at issue)
B. F. Goodrich Company
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.