Granted Patent
Utility
US 6,136,649 · App. 09/416,389
Method for removing anti-reflective coating layer using plasma etch process after contact CMP
Inventors:
Angela T. Hui, Wenge Yang, Kashmir Sahota, Mark T. Ramsbey, Suzette K. Pangrle, Minh Van Ngo
Patented Case
View Patent ↗
Granted: Oct 24, 2000
Filed: Oct 12, 1999
Inventors
Angela T. Hui
Wenge Yang
Kashmir Sahota
Mark T. Ramsbey
Suzette K. Pangrle
Minh Van Ngo
Assignee (at issue)
Advanced Micro Devices, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.