Granted Patent
Utility
US 6,136,690 · App. 09/023,523
In situ plasma pre-deposition wafer treatment in chemical vapor deposition technology for semiconductor integrated circuit applications
Inventor:
Weimin Li
Patented Case
View Patent ↗
Granted: Oct 24, 2000
Filed: Feb 13, 1998
Inventor
Weimin Li
Assignee (at issue)
Micron Technology, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.