Granted Patent
Utility
US 6,143,080 · App. 09/493,492
Wafer processing reactor having a gas flow control system and method
Inventors:
Lawrence D. Bartholomew, Robert J. Bailey, Robert Ewald, John Boland
Patented Case
View Patent ↗
Granted: Nov 7, 2000
Filed: Jan 28, 2000
Inventors
Lawrence D. Bartholomew
Robert J. Bailey
Robert Ewald
John Boland
Assignee (at issue)
Silicon Valley Group, Thermal Systems LLP
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.