Granted Patent
Utility
US 6,143,667 · App. 09/340,985
Method and apparatus for using photoemission to determine the endpoint of an etch process
Inventor:
Eugene P. Marsh
Patented Case
View Patent ↗
Granted: Nov 7, 2000
Filed: Jun 28, 1999
Inventor
Eugene P. Marsh
Assignee (at issue)
Micron Technology, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.