Granted Patent
Utility
US 6,146,797 · App. 09/204,894
Focused ion beam lithography method with sample inspection through oblique angle tilt
Inventor:
Toshiaki Fujii
Patented Case
View Patent ↗
Granted: Nov 14, 2000
Filed: Dec 3, 1998
Inventor
Toshiaki Fujii
Assignee (at issue)
SEIKO INSTRUMENTS INC.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.