IP Library Granted Patent US 6,146,989
Granted Patent Utility
US 6,146,989 · App. 08/975,046

Method of fabricating semiconductor device with cavity interposed between wirings

Inventor: Norio Okada
Patented Case View Patent ↗
Granted: Nov 14, 2000 Filed: Nov 20, 1997
Inventor
Norio Okada
Assignee (at issue)
NEC CORPORATION

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Quick Facts
Patent No.
US 6,146,989
App. No.
08/975,046
Filed
1997-11-20
Granted
2000-11-14
Kind
A