Granted Patent
Utility
US 6,166,413 · App. 08/808,422
Semiconductor device having field effect transistors different in thickness of gate electrodes and process of fabrication thereof
Inventor:
Atsuki Ono
Patented Case
View Patent ↗
Granted: Dec 26, 2000
Filed: Feb 28, 1997
Inventor
Atsuki Ono
Assignee (at issue)
NEC CORPORATION
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.