Granted Patent
Utility
US 6,174,377 · App. 09/225,081
Processing chamber for atomic layer deposition processes
Inventors:
Kenneth Brian Doering, Carl Galewski, Prasad N. Gadgil, Thomas E. Seidel
Patented Case
View Patent ↗
Granted: Jan 16, 2001
Filed: Jan 4, 1999
Inventors
Kenneth Brian Doering
Carl Galewski
Prasad N. Gadgil
Thomas E. Seidel
Assignee (at issue)
Genus, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.