Granted Patent
Utility
US 6,177,316 · App. 09/412,278
Post barrier metal contact implantation to minimize out diffusion for NAND device
Inventors:
Yue-Song He, Kent Kuohua Chang, John Jianshi Wang
Patented Case
View Patent ↗
Granted: Jan 23, 2001
Filed: Oct 5, 1999
Inventors
Yue-Song He
Kent Kuohua Chang
John Jianshi Wang
Assignee (at issue)
Advanced Micro Devices, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.